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AccuThermo AW 610,originally AG Heatpulse 610 for RTA RTP from Allwin21 Corp |
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(Click image for full size) AccuThermo AW 610 is a desktop rapid thermal processor which uses high-intensity, visible radiation to heat single wafer for short periods at precisely controlled temperatures. These capabilities, combined with the heating chamber's cold-wall design, superior heating uniformity advanced temperature control technology and AW 900 new software, provide significant advantages over conventional furnace processing and conventional RTP systems. AccuThermo AW 610â��s key features include: Advanced ERP Pyrometer for precise high temperature measurement Add timer watch for the oven safety issue (the original has no safety interlock for the computer locks up, chamber would be burned if the computer locks up when process running). The new software with power summary function to detect either lamp failure or sensor failure Manual Operation Use Sumpower as a parameter to control the uniformity of the wafer. Closed-loop temperature control with pyrometer or thermocouple temperature sensing. Precise time-temperature profiles tailored to suit specific process requirements. High-intensity visible radiation heats wafers for short periods. Fast heating and cooling rates unobtainable in conventional technologies. Consistent wafer-to-wafer process cycle repeatability. Elimination of external contamination. Small footprint and energy efficiency. Software calibration and easy to be done. More functions and I/O hardware â��exposedâ�� for easier maintenance and trouble shooting. It is easy to edit recipe with GUI and graph display. Save all process data on the computer hard disk. A/D and D/A precision is 14 to 16 bits. Detect in process and with color curve displayed on the screen. Lamp damage detect in process. Sensor status detect function. On line help function AccuThermo AW 610 RTA RTP is a versatile tool, which is useful for many applications: â�¢ Ion Implant Activation â�¢ Polysilicon Annealing â�¢ Oxide Reflow â�¢ Silicide Formation â�¢ Contact Alloying â�¢ Oxidation and Nitridation â�¢ GaAs Processing For a bibliography and reprints of technical journal articles regarding these AccuTherm applications, contact the Allwin21 Corp. Marketing Communications Department. AccuThermo AW 610 RTA RTP performance specification: Recommended Steady-State Temperature Range: 100-1250�° C. Steady-State Temperature Stability: �± 1�° C. Temperature Monitoring Mechanisms: Extended Range Pyrometer (ERP),used for process temperatures from 600�°C to 1250�°C or a thermocouple, used for process temperatures below 800�° C. Heating Rate: 1-200�° C per second, user-controllable, 10�°C to 120�°C for wafer, Programmable. Cooling Rate: Temperature dependent; max 150�° C per second. Maximum Non-uniformity: Radiant Flux: �±0.25% Sheet resistivity(Post-anneal sheet resistivity measured on a 150mm wafer annealed at 1100�° C for 10 seconds. R&D models optimized for slip control): <2% (Dose Monitoring Units) <1.35% (R&D Units) Implant: As 1E16 50 KeV with implant uniformity 0.3% Steady state process time 0 to 30000 sec programmable Wafer Sizes for the AccuTherm AW 610: 2", 3", 4", 5" and 6". Process Gases: The AccuTherm AW 610 system delivers one non-corrosive process gas with one MFC. Up to four MFC is optional. AccuThermo AW 610 specifications above may change as different models are introduced or as design enhancements are implemented.
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